PUBLISHER: Blueweave Consulting | PRODUCT CODE: 1658708
PUBLISHER: Blueweave Consulting | PRODUCT CODE: 1658708
Global Extreme Ultraviolet (EUV) Lithography Market Size Zooming 4.3X During 2025-2031
Global Extreme Ultraviolet (EUV) Lithography Market is flourishing because of a surging demand for advanced semiconductor devices with smaller nodes and the growing adoption of EUV lithography in the manufacturing of high performance integrated circuits.
BlueWeave Consulting, a leading strategic consulting and market research firm, in its recent study, estimated Global Extreme Ultraviolet (EUV) Lithography Market size at USD 11.30 billion in 2024. During the forecast period between 2025 and 2031, BlueWeave expects Global Extreme Ultraviolet (EUV) Lithography Market size to boom at a robust CAGR of 23.20% reaching a value of USD 48.20 billion by 2031. A spurring demand for semiconductor chips from the thriving consumer electronic devices, cars, and high performance computers is one of the main drivers of Global Extreme Ultraviolet (EUV) Lithography Market. EUV lithography offers remarkable scalability and precision. The need for EUV lithography is expected to rise in tandem with the semiconductor industry's fast innovation, technical improvements, and increased investment in data center infrastructure.
Opportunity - Increasing Demand for Smaller and Powerful Chips
As semiconductor manufacturing advances, there is a rising demand for smaller, more powerful, and energy-efficient chips to support technologies like AI, 5G, and IoT. Extreme ultraviolet (EUV) lithography plays a significant role in achieving these advancements by enabling the production of smaller nodes (such as 5nm and 3nm processors) with great precision and accuracy. With an increasing demand for smaller chips, manufacturers and industry players are expanding their production capacities to meet growing market demand. For instance, Rapidus, a Japan-based semiconductor manufacturer, announced its plans to install 10 EUV lithography machines in its semiconductor plants for early mass production.
Impact of Escalating Geopolitical Tensions on Global Extreme Ultraviolet (EUV) Lithography Market
Intensifying geopolitical tensions could put significant pressure on the growth of Global Extreme Ultraviolet (EUV) Lithography Market. One of the key challenges is the interruption of supply chains caused by geopolitical crises. The reason for this is because EUV lithography requires certain tools, supplies, and technology that must be imported from other nations, like United States, Japan, and the Netherlands. However, rising hostilities between powerful nations, such as the US and China, result in limitations or taxes on these supply. Production may be hampered by this, raising expenses. Trade limitations, like those governing the sale of sophisticated semiconductor technology to China, might hurt companies like ASML, a semiconductor firm located in the Netherlands that is the only one capable of producing EUV machines.
Light Source Segment Leads Global EUV Lithography Market
The light source segment holds the largest share of Global Extreme Ultraviolet (EUV) Lithography Market. In order to meet the growing market demand, major companies like TRUMPF are investing heavily in producing light source equipment and forming strategic alliances to boost semiconductor research and development. Extreme ultraviolet (EUV) light, which has a wavelength of 13.5 nm, is used to reduce the size of silicon chips used in memory chips and processors by a few nanometers. These strategies are anticipated to propel the segment's market growth during the forecast period.
Asia Pacific Dominates Global EUV Lithography Market
Asia Pacific maintains the leadership position in Global Extreme Ultraviolet (EUV) Lithography Market. China and Taiwan are two Asian nations that control the majority of the world's semiconductor production; according to The Guardian, Taiwan produces 90% of the most advanced semiconductors worldwide. A leading supplier to Apple and Nvidia, Taiwan Semiconductor Manufacturing Co. LTD. (TSMC) is at the forefront of the Taiwanese semiconductor industry. Other Asia countries like South Korea also cover a significant share in the semiconductor production industry. Its market is expected to increase as a result of the region's businesses implementing advanced production technologies, such as EUV lithography.
Competitive Landscape
The major industry players of Global Extreme Ultraviolet (EUV) Lithography Market include ASML Holding NV, NTT Advanced Technology Corporation, Canon Inc., Nikon Corporation, Intel Corporation, Taiwan Semiconductor Manufacturing Company Limited, Samsung Electronics Co. Ltd, Toppan Photomasks Inc., ZEISS Group, and Ushio, Inc. The presence of high number of companies intensify the market competition as they compete to gain a significant market share. These companies employ various strategies, including mergers and acquisitions, partnerships, joint ventures, license agreements, and new product launches to further enhance their market share.
The in-depth analysis of the report provides information about growth potential, upcoming trends, and Global Extreme Ultraviolet (EUV) Lithography Market. It also highlights the factors driving forecasts of total market size. The report promises to provide recent technology trends in Global Extreme Ultraviolet (EUV) Lithography Market and industry insights to help decision-makers make sound strategic decisions. Furthermore, the report also analyzes the growth drivers, challenges, and competitive dynamics of the market.
*Financial information of non-listed companies can be provided as per availability.
**The segmentation and the companies are subject to modifications based on in-depth secondary research for the final deliverable